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Back to topSpacer Engineered Finfet Architectures: High-Performance Digital Circuit Applications (Hardcover)
$243.00
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Description
This book focusses on the spacer engineering aspects of novel MOS-based device-circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.
About the Author
Sudeb Dasgupta, Brajesh Kumar Kaushik, Pankaj Kumar Pal